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apply evenly to damp hair from lengths to tips
follow with the most suitable conditioner or mask
BUTYROSPERMUM PARKII BUTTER / BUTYROSPERMUM PARKII (SHEA) BUTTER
tris(tetramethylhydroxypiperidinol) citrate
MINU Hair Mask - Next Generation Style apply evenly to damp hairWhat Illuminating and restoring mask that gives extra shine and deep nourishment. How to Use Apply to towel dried hair after using MINU shampoo. Leave on for 10 15 minutes, comb, then rinse. Proceed with the desired styling. Ingredients Water, cetearylalcohol, glycerin, behentrimonium chloride, cetrimonium chloride, phenylpropyldimethylsiloxysilicate, behentrimonium methosulfate, cyclopentasiloxane, fragrance, amodimethiconesilsesquioxane copolymer,